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We report on the growth of high-quality GaAs semiconductor materials on an AlAs/sapphire substrate by molecular beam epitaxy. The growth of GaAs on sapphire centers on a new single-step growth technique that produces higher-quality material than a previously reported multi-step growth method. Omega-2theta scans confirmed the GaAs (111) orientation. Samples grown at 700 °C displayed the highest crystal quality with minimal defects and strain, evidenced by narrow FWHM values of the rocking curve. By varying the As/Ga flux ratio and the growth temperature, we significantly improved the quality of the GaAs layer on sapphire, as compared to that obtained in multi-step studies. Photoluminescence measurements at room temperature and 77 K further support these findings. This study underscores the critical role of the As/Ga flux ratio and growth temperature in optimizing GaAs epitaxial growth on sapphire.more » « less
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Shetty, Satish; Kuchuk, Andrian V; Maia_de_Oliveira, Fernando; Kryvyi, Serhii; Li, Chen; Minor, Paul; Zamani-Alavijeh, Mohammad; M_Eldose, Nirosh; Das, Subhashis; Baral, Dinesh; et al (, Crystal Growth & Design)
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